Description of sample: • Patterned surface with superimposed sinusoids created using E-beam lithography technique. • This digital surface twin contains pattern M + L - Large wavelength (L with λ - 19.5 µm and amplitude - 10 nm) - Medium wavelength (M with λ - 3.12 µm and amplitude - 4 nm) Topography was measured using: 1. White Light Interferometer (Bruker Contour GT-I optical profilometer in phase shift interferometry mode) 2. Stylus profilometer (Alpha Step IQ KLA Tencor Stylus Profilometer with tip radius 5.9 µm) 3. Atomic Force Microscope (Bruker Dimension Icon VI with TapDLC 3000 tips of radius approximately 20 nm) Data used in paper: https://doi.org/10.1021/acs.langmuir.4c00669 Tuning Surface Adhesion Using Grayscale Electron-beam Lithography Authors: • Arushi Pradhan. Affiliation 1. ORCID: 0000-0001-8169-7900 • Luke A. Thimons. Affiliation 1. ORCID: 0000-0003-4511-1807 • Nickolay Lavrik. Affiliation 2. ORCID: 0000-0002-9543-5634 • Ivan I. Kravchenko. Affiliation 2. ORCID: 0000-0003-4999-5822 • Tevis D.B. Jacobs. Affiliation 1. ORCID: 0000-0001-8576-914X Affiliations: 1. Department of Mechanical Engineering and Materials Science, University of Pittsburgh, 3700 O’Hara St., Pittsburgh, PA 15208 2. Oak Ridge National Laboratory, Oak Ridge, TN 37830 Corresponding Author: Tevis Jacobs (tjacobs@pitt.edu)